Sputtering System

In-line Vetical Static Sputter (SuVas-VS Series)


  • LST Series is a device for depositing oxide and metal materials in a vacuum state on a large-area substrate for thin film transistor manufacturing.


  • -Vertical Static Type
    -Optimized design reduces equipment weight and minimizes foot print
    -Minimize particles inside chamber through non-contact conveying system
    -Possible to form multi layer
    -Improved thin film quality and maximizes target use efficiency by moving magnet of Cathode part


  • -Substrate size: 8th generation glass or more
    -Tact Time: Within 60sec (TFT stop film formation type)
    -Deposition materials: ITO, SIO, TIO, ZnO, CrOx, AZO, GZO, IGZO
    -Power source: DC, Pulsed DC or MF
    -Thickness uniformity: Within ± 10% (Static film formation type)
    -Surface resistance: ± 12 Within%
    -Heating Temperature: 250 ° C (Based on Board Temperature)
    -Heating Temperature Uniformity: Within 15 ° C