Roll-to-Roll System(Flexible Substrate)
- Roll to Roll SPUTTER is widely used for deposition on flexible film.
The application of Roll to Roll SPUTTER varies depending on substrate type and product.
- 2 Process Chambers and 1 L/Un-loading Chamber
16 Cathodes with dual cylindrical targets using pulsed DC
Rs measurement by In-situ Non-Contact Eddy Current type
Tension controlled by load-cell
Slit Valve (Lip Seal) preserves vacuum in the process chambers
Web sputtering process on Both sides or Single side of flexible material
-Number of Coating Sources
1 ~ 5 Sources / Drum
PET, PEN, PI, PA, PC,TAC, Metal Foils, etc.
-Film Width ( ㎜ )
500 ~ 1,350
-Substrate thickness for POLymers ( ㎛ )
25 ~ 500
-Max Roll Diameter ( ㎜ )
-Substrate Speed (m/min)
0.5 ~ 25
70 ~ 700
-Base Pressure (Torr)
2 × 10 -6
-Coating drum temperature ( ℃ )
-15 to 150