Products
Sputtering System
Vertical Cluster Sputter (SuVas-CV Series)
Outline
- SuVas-CV series is used for electrode layer process of LCD or OLED panel production by sputtering oxide or metal material on medium size substrate.
Features
- -Cluster vertical type
-Minimizes installation space and weight of equipment throughout the optimized design
-Minimize particles inside the chamber using a non-contact transfer system
-Can form multiple layers in one process cycle
-Maximize target efficiency and improve thin film quality by moving magnet in cathode
Specifications
- -Applicable Substrate Size: Standard G6 Substrate
-Tact time: within 50 seconds (based on 2 steps) / within 120 seconds (based on 3 processes)
-Target materials: metals (Ag, Al, Ti, Mo, etc.), ITO
-Power: DC, Pulsed DC Power
-Thickness uniformity: less than 5%
-Sheet resistance: within ± 10%
-Heating temperature: 230 ℃ (based on the substrate high temperature), 60 ℃ (based on the substrate low temperature)
-Temperature uniformity: less than ± 5%