Sputtering System

In-line Horizontal Sputter (SuVas-HD Series)


  • SuVas-HD Series is used for electrode layer process of solar or architecture panel production by sputtering oxide or metal materials on medium size substrates.


  • -Horizontal dynamic type
    -Minimizes installation space and weight of equipment throughout the optimized design
    -Minimize particles inside the chamber using a non-contact transfer system
    -Can form multiple layers in one process cycle
    -Maximize target efficiency and improve thin film quality by moving magnet in cathode


  • -Applicable Substrate Size: Various
    -Target materials: metals and oxides
    -Power: DC, Pulsed DC, MF, RF
    -Thickness uniformity: less than 5%
    -Heating temperature: less than 250 ℃ on the substrate
    -Temperature uniformity: within ± 15 ℃