Products
Sputtering System
In-line Vetical Dynamic Sputter (SuVas-VD Series)
Outline
- LSF Series is equipment for depositing oxide and metal materials in a vacuum state on large area substrate for color filter manufacturing
Features
- -Vertical In-line Type
-Optimized design reduces equipment weight and minimizes foot print
-Minimize particles inside chamber through non-contact conveying system
-Possible to form multi layer
-Improved thin film quality and maximizes target use efficiency by moving magnet of Cathode part
Specifications
- -Substrate size: 8th generation glass or more -Tact Time: within 35sec (C / F dynamic type)-Deposition materials: ITO, SIO, TIO, ZnO, CrOx, AZO, GZO, IGZO-Power source: DC, Pulsed DC or MF-Thickness uniformity: ± 5% or less (dynamic type)-Surface resistance: ± 12 % Within -Heating temperature: 250 ° C (Based on substrate temperature)-Heating temperature uniformity: Within 15 ° C