Products
Sputtering System
In-line Horizontal Sputter (SuVas-HD Series)
Outline
- SuVas-HD Series is used for electrode layer process of solar or architecture panel production by sputtering oxide or metal materials on medium size substrates.
Features
- -Horizontal dynamic type
-Minimizes installation space and weight of equipment throughout the optimized design
-Minimize particles inside the chamber using a non-contact transfer system
-Can form multiple layers in one process cycle
-Maximize target efficiency and improve thin film quality by moving magnet in cathode
Specifications
- -Applicable Substrate Size: Various
-Target materials: metals and oxides
-Power: DC, Pulsed DC, MF, RF
-Thickness uniformity: less than 5%
-Heating temperature: less than 250 ℃ on the substrate
-Temperature uniformity: within ± 15 ℃