Products
Solar
Horizontal In-Line System
Outline
- SuVAS™ H-Series are used to deposit thin-film layers, such as back electrode, CIG precursor, and TCO layers. The equipment operates with dual glass loading technology and cylindrical cathodes.
Features
- Horizontal in-line type system
Minimizing particles inside the chamber
Simplified distributing using non-carrier transfer system
Maximizing the efficiency of target usage and improving quality of thin-film by target rotation and moving the magnet on the cathode part
Dual glass loading technology and cylindrical cathodes
High throughput and extended target utilization rate.
Specifications
-Applicable Substrate Size
Max Gen 8th Substrate
-Tact Time
Within 60sec
-Target Materials
Ag, Al, Al2O3, AlNd, AZO, CIGS, Cr, Cu, CuGa, CuIn, GZO, IGZO, In, ITO, IZO, Mo, MoTi, MoW, Ni, Se, SiO2, TiO2, ZnO
-Power Source
DC, Pulsed DC or MF
-Thickness Uniformity (%)
Within ±5%
-Sheet Resistance Uniformity
Within ±12%
-Heating Temp
Max 250℃ (Based on substrate temp.)
-Heating Temp. Uniformity
Within ±15℃