Products
Solar
Atomic Layer Deposition (ALD) System
Outline
- AEON™ Atomic layer deposition (ALD) system can produce a dense and conformal Zinc Oxysulfide Zn(O,S) buffer layer. Using ALD conveniently eliminates the wet process, chemical bath deposition (CBD), from the process flow, which in turn simplifies production routines and significantly reduces cost.
Features
- Cluster System (5PM + 1LL)
Batch System
Thermal ALD Process
Dry Process in Vacuum
ALD is possible to adjust and optimize the Oxygen / Sulfur (O/S) ratio of the film type of the CIGS layer.
Specifications
-Application
Dense and conformal Zinc Oxysulfide Zn(O,S) buffer layer
-Substrate Size (㎜)
600 × 1,200, 1,300 × 1600
-Target Materials
Zn (O,S), ZnO
-Thickness (㎜)
10 ~ 50
-Thickness Uniformity (%)
Within ± 5
-Process Temperature (℃)
100 ~ 170
-Temperature Uniformity (%)
Within ± 5 (@ 150℃)