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Solar

Atomic Layer Deposition (ALD) System

Outline

  • AEON™ Atomic layer deposition (ALD) system can produce a dense and conformal Zinc Oxysulfide Zn(O,S) buffer layer. Using ALD conveniently eliminates the wet process, chemical bath deposition (CBD), from the process flow, which in turn simplifies production routines and significantly reduces cost.

Features

  • Cluster System (5PM + 1LL)
    Batch System
    Thermal ALD Process
    Dry Process in Vacuum
    ALD is possible to adjust and optimize the Oxygen / Sulfur (O/S) ratio of the film type of the CIGS layer.

Specifications


  • -Application

    Dense and conformal Zinc Oxysulfide Zn(O,S) buffer layer

    -Substrate Size ()

    600 × 1,200, 1,300 × 1600

    -Target Materials

    Zn (O,S), ZnO

    -Thickness ()

    10 ~ 50

    -Thickness Uniformity (%)

    Within ± 5

    -Process Temperature ()

    100 ~ 170

    -Temperature Uniformity (%)

    Within ± 5 (@ 150)